Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components

Sven Schröder; Hein Uhlig; Angela Duparré; Norbert Kaiser

doi:10.1117/12.624499

4 October 2005 Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components

Sven Schröder, Hein Uhlig, Angela Duparré, Norbert Kaiser

Proceedings Volume 5963, Advances in Optical Thin Films II; 59630R (2005) https://doi.org/10.1117/12.624499
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads to extraordinary demands on the optical components involved (high throughput, low scattering, high mechanical stability, ...). Fluorides are the main or even the only candidates for film materials in these spectral regions because of their low absorption. There are several high-index and low-index fluoride materials. These materials, however, may significantly differ in their nanostructural properties leading to scatter losses crucially influencing the performance of the multilayers. In order to find optimal material combinations, HR multilayer mirrors were fabricated using several high-index fluoride film materials. Spectral photometry, atomic force microscopy, as well as total and angle resolved light scattering measurement and analysis were performed for comprehensive characterization.

Citation Download Citation

Sven Schröder, Hein Uhlig, Angela Duparré, and Norbert Kaiser "Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630R (4 October 2005); https://doi.org/10.1117/12.624499

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