Deoxyribonucleic acid (DNA) based photonic materials: current status

James G. Grote; Emily M. Heckman; Joshua A. Hagen; Perry P. Yaney; Darnell E. Diggs; Guru Subramanyam; Robert L. Nelson; John S. Zetts; De Yu Zang; F. Kenneth Hopkins

doi:10.1117/12.632476

28 October 2005 Deoxyribonucleic acid (DNA) based photonic materials: current status

James G. Grote, Emily M. Heckman, Joshua A. Hagen, Perry P. Yaney, Darnell E. Diggs, Guru Subramanyam, Robert L. Nelson, John S. Zetts, De Yu Zang, F. Kenneth Hopkins

Author Affiliations +

Proceedings Volume 5990, Optically Based Materials and Optically Based Biological and Chemical Sensing for Defence II; 59900D (2005) https://doi.org/10.1117/12.632476
Event: European Symposium on Optics and Photonics for Defence and Security, 2005, Bruges, Belgium

Abstract

Suitable polymer-based photonic materials must possess the desired optical and electromagnetic properties for optimal device performance depending on the intended application. A new class of polymer, processed from purified deoxyribonucleic acid (DNA), has been investigated for use in photonic applications and has shown promise as an excellent optical waveguide material. In this paper we present the current optical and electronic properties of this new DNA-based biopolymer, including optical loss, temperature stability, refractive index, resistivity, dielectric constant and microwave insertion loss.

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James G. Grote, Emily M. Heckman, Joshua A. Hagen, Perry P. Yaney, Darnell E. Diggs, Guru Subramanyam, Robert L. Nelson, John S. Zetts, De Yu Zang, and F. Kenneth Hopkins "Deoxyribonucleic acid (DNA) based photonic materials: current status", Proc. SPIE 5990, Optically Based Materials and Optically Based Biological and Chemical Sensing for Defence II, 59900D (28 October 2005); https://doi.org/10.1117/12.632476

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