Paper
7 February 2006 Pulsed laser cleaning of sub- and micron-size contaminant particles from optical surfaces: cleaning versus ablation and damage
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Abstract
Pulsed laser cleaning of sub- and micron-sized (0.3-10 μm) monodispersed model spherical polystyrene particles and fused silica particles from fused silica and glass optical surfaces was performed by means of ns TEA CO2 laser. Efficient removal of these absorbing particles has been demonstrated in certain laser fluence range, which is below the threshold for ablative damage of the fused silica and glass substrate. Removal mechanisms of dry and steam laser cleaning of various critical optical surfaces are discussed.
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Shishir Shukla, Sergey Kudryashov, Kevin Lyon, and Susan D. Allen "Pulsed laser cleaning of sub- and micron-size contaminant particles from optical surfaces: cleaning versus ablation and damage", Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59910N (7 February 2006); https://doi.org/10.1117/12.638820
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Cited by 2 scholarly publications.
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KEYWORDS
Particles

Glasses

Laser damage threshold

Silica

Stanford Linear Collider

Gas lasers

Pulsed laser operation

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