Laser conditioning of high-reflective and anti-reflective coatings at 1064 nm

Yuanan Zhao; Jianda Shao; Hongbo He; Zhengxiu Fan

doi:10.1117/12.634130

7 February 2006 Laser conditioning of high-reflective and anti-reflective coatings at 1064 nm

Yuanan Zhao, Jianda Shao, Hongbo He, Zhengxiu Fan

Proceedings Volume 5991, Laser-Induced Damage in Optical Materials: 2005; 599117 (2006) https://doi.org/10.1117/12.634130
Event: Boulder Damage Symposium XXXVII: Annual Symposium on Optical Materials for High Power Lasers, 2005, Boulder, CO, United States

Abstract

Laser conditioning effects of the HfO₂/SiO₂ High-reflective (HR) and Anti-reflective (AR) coatings at 1064 nm and the accumulation effects of multi-shot laser radiation were investigated. The HfO₂/SiO₂ HR and AR coatings were prepared by E-beam evaporation (EBE). The single-shot and multi-shot laser induced damage threshold was detected following ISO standard 11254-1.2, and the laser conditioning was conducted by three-step raster scanning method. It was found that laser damage resistance of the HR coatings for both single-shot and multi-shot laser radiation was enhanced after laser conditioning, and the single-shot laser induced damage threshold (LIDT) got the greatest enhancement. There was obvious shot to shot laser damage accumulations for HR samples and the LIDT decreased as the shot number increased. Laser conditioning can also improve the multi-shot laser damage accumulations behaviors of the HR samples. However, the AR coatings had no laser conditioning enhancement and multi-shot laser damage accumulation effects. A Nomarski microscope was employed to map the damage morphology, and it found that the damage behavior was defect-initiated for both samples.

Citation Download Citation

Yuanan Zhao, Jianda Shao, Hongbo He, and Zhengxiu Fan "Laser conditioning of high-reflective and anti-reflective coatings at 1064 nm", Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 599117 (7 February 2006); https://doi.org/10.1117/12.634130

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