Novel nano-scale overlay alignment method for room-temperature imprint lithography

Li Wang; Yucheng Ding; Bingheng Lu; Zhihui Qiu

doi:10.1117/12.674257

9 June 2006 Novel nano-scale overlay alignment method for room-temperature imprint lithography

Li Wang, Yucheng Ding, Bingheng Lu, Zhihui Qiu

Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61491V (2006) https://doi.org/10.1117/12.674257
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

A novel nano-scale alignment technique based on Moire fringe for room-temperature imprint lithography in the submicron realm is proposed. A pair of special slant gratings is used as alignment marks on the wafer and template respectively. Moire signals generated by alignment marks are projected onto a photo-detector array, then the detected signals are used to estimate the alignment errors in x and y directions respectively. Test results indicate that complex differential Moire signal is more sensitive to relative displacement of the pair of marks than each single Moire signal, and the alignment resolutions obtained in x and y directions are ±20nm (3σ) and ±25nm(3σ) respectively. They can meet the requirement of alignment accuracy for submicron imprint lithography.

Citation Download Citation

Li Wang, Yucheng Ding, Bingheng Lu, and Zhihui Qiu "Novel nano-scale overlay alignment method for room-temperature imprint lithography", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491V (9 June 2006); https://doi.org/10.1117/12.674257

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