Wavefront analysis and beam profiling from 40 eV up to 40 keV

Thomas Nisius; David Schäfer; Rolf Früke; Thomas Wilhein

doi:10.1117/12.690297

29 August 2006 Wavefront analysis and beam profiling from 40 eV up to 40 keV

Thomas Nisius, David Schäfer, Rolf Früke, Thomas Wilhein

Proceedings Volume 6317, Advances in X-Ray/EUV Optics, Components, and Applications; 63171E (2006) https://doi.org/10.1117/12.690297
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

A wavefront sensing and beam monitoring system applicable to various kinds of X-ray and EUV sources like synchrotron radiation from undulators, X-ray lasers and laser induced plasma sources in the spectral range from 40 eV up to 40 keV is presented. One of the main applications will be the feedback for adaptive optical elements, e.g. deformable mirrors, for X-rays above 10 keV. It also provides the possibility to estimate the source dimension and distance. The wavefront sensor is based on a modified Hartmann setup; the beam is sampled by a rectangular grid and generates a distorted image on the detector. Comparison of this image with a known reference yields the wavefront's local slope at an extensive number of points. However, the Hartmann pattern is not directly imaged but is converted to the visible spectral range by a scintillator. This offers the possibility to use off the shelf cameras for image acquisition. First measurements, performed at the VUV-FEL (DESY, Hamburg) and at ELETTRA (Trieste), show the feasibility of this approach. The Hartmann principle offers the advantage to measure both, intensity and phase, thus allowing to reconstruct not only the wavefront but also the beam profile. Wavefront resolution of up to λ/100 (λ = 1 nm) can be achieved. The intensity profile and the beam shape can be measured with a spatial resolution better than 10 μm. With the current setup it is also possible to analyze the temporal and spatial stability of the source.

Citation Download Citation

Thomas Nisius, David Schäfer, Rolf Früke, and Thomas Wilhein "Wavefront analysis and beam profiling from 40 eV up to 40 keV", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63171E (29 August 2006); https://doi.org/10.1117/12.690297

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KEYWORDS

Wavefronts

Wavefront sensors

Sensors

Crystals

X-rays

Scintillators

Extreme ultraviolet

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