Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing

Thomas Sure; Lambert Danner; Peter Euteneuer; Gerhard Hoppen; Armin Pausch; Wolfgang Vollrath

doi:10.1117/12.692202

17 July 2006 Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing

Thomas Sure, Lambert Danner, Peter Euteneuer, Gerhard Hoppen, Armin Pausch, Wolfgang Vollrath

Proceedings Volume 6342, International Optical Design Conference 2006; 63420E (2006) https://doi.org/10.1117/12.692202
Event: International Optical Design Conference 2006, 2006, Vancouver, BC, Canada

Abstract

During the last years, new microscope applications require an increased resolution which enforces the development of new state of the art high NA immersion objectives. With the introduction of the 4Pi confocal fluorescence microscope, the increase of the numerical aperture from NA=1.4 to NA=1.46 makes sense, although the gain of lateral resolution is quite small. On the other hand, for inspection and metrology in the semiconductor industry the continuously decreasing structures need the highest possible resolution, which can be achieved with high NA water immersion objectives working in the DUV wavelength range. Building this kind of objectives requires special measuring and testing technologies and a manufacturing precision which has never been realized before in series production.

Citation Download Citation

Thomas Sure, Lambert Danner, Peter Euteneuer, Gerhard Hoppen, Armin Pausch, and Wolfgang Vollrath "Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing", Proc. SPIE 6342, International Optical Design Conference 2006, 63420E (17 July 2006); https://doi.org/10.1117/12.692202

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