Characterization and adjustment of high performance objectives for DUV applications

Stefan Müller-Pfeiffer; Lienhard Körner; Stefan Franz; Oliver R. Falkenstörfer; Hans Lauth

doi:10.1117/12.712506

5 April 2007 Characterization and adjustment of high performance objectives for DUV applications

Stefan Müller-Pfeiffer, Lienhard Körner, Stefan Franz, Oliver R. Falkenstörfer, Hans Lauth

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65184Q (2007) https://doi.org/10.1117/12.712506
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Aside from steppers also inspection systems in the semiconductor industry as well as in micro material processing require DUV imaging optics with very high optical requirements. A test and adjustments set-up based on the Shack-Hartmann wave front sensor for objectives and telescopes is presented. It allows primarily to characterize the image quality of systems under test for both finite as well as infinite object and image distances. From the wave front the modulation transfer function, point spread function or encircled energy data can be derived. Also, other data such as magnifications, focal lengths and even distortion with micrometer accuracy can be obtained with the test bench. The test system consists of a spherical waves generator, the sensor including adapting optics and the mechanical motion system. It is highly motorized and all essential functions are computer controlled. The available wavelengths currently range from NIR to 193nm.

Citation Download Citation

Stefan Müller-Pfeiffer, Lienhard Körner, Stefan Franz, Oliver R. Falkenstörfer, and Hans Lauth "Characterization and adjustment of high performance objectives for DUV applications", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184Q (5 April 2007); https://doi.org/10.1117/12.712506

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