Simultaneous, Nondestructive Analysis Of Thickness And Composition Of Multilayer Metal Films Using A Fundamental Parameter XRF Approach.

R. Linder; G. Kladnik; J. Augenstine

doi:10.1117/12.936617

12 August 1986 Simultaneous, Nondestructive Analysis Of Thickness And Composition Of Multilayer Metal Films Using A Fundamental Parameter XRF Approach.

R. Linder, G. Kladnik, J. Augenstine

Author Affiliations +

Proceedings Volume 0691, X-Ray Imaging II; (1986) https://doi.org/10.1117/12.936617
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

General algorithms have been developed for interpreting X-ray fluorescence (XRF) data from single and multilayer metal films to yield precise values for both thickness and composition. As an example, the relative precision for a replicate analysis of a multilayer Al-Ti-Cu (substrate) sample was measured to be 0.6% (lo) for a 14 micron Al layer and 2.4% (lσ) for a 65OÅR Ti underlayer. Several examples showing the rapid, nondestructive nature of the analysis will be presented.

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R. Linder, G. Kladnik, and J. Augenstine "Simultaneous, Nondestructive Analysis Of Thickness And Composition Of Multilayer Metal Films Using A Fundamental Parameter XRF Approach.", Proc. SPIE 0691, X-Ray Imaging II, (12 August 1986); https://doi.org/10.1117/12.936617

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