Paper
21 August 2009 Recent achievements using chemical vapor composite silicon carbide (CVC SiC)
Author Affiliations +
Abstract
This annual review documents our progress towards inexpensive mass production of silicon carbide mirrors and optical structures. Results are provided for a NASA Small Business Technology Transfer (STTR) X-Ray Mirror project. Trex partnered with the University of Alabama-Huntsville Center for Advanced Optics (UAH-CAO) to develop fabrication methods for polished cylindrical and conical chemical vapor composite (CVCTM) SiC mandrels. These mandrels are envisioned as pre-forms for the replication of fused silica x-ray optics to be eventually used in the International X-Ray Observatory (IXO). CVC SiCTM offers superior high temperature stability, thermal and mechanical performance and polishability required for this precision replication process. In this program, Trex fabricated prototype mandrels with design diameters of 10.5cm, 20cm and 45cm. UAH-CAO was Trex's university partner in this effort and worked on polishing and metrology of the unusual x-ray mandrel geometries. UAH-CAO successfully developed an innovative interferometric method for measuring the CVC SiCTM x-ray mandrels based on a precision cylindrical lens system. UAH-CAO also developed finishing and polishing methods for CVC SiCTM that utilized a Zeeko IRP200 computer controlled polishing tool. The three technologies key technologies demonstrated in this program (near net shape forming of CVC SiCTM mandrels, the x-ray mandrel metrology and free-form polishing capability on CVC SiCTM) could enable cost-effective manufacture of the x-ray mandrels required for the International X-Ray Observatory (IXO).
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William A. Goodman and Clifford Tanaka "Recent achievements using chemical vapor composite silicon carbide (CVC SiC)", Proc. SPIE 7425, Optical Materials and Structures Technologies IV, 74250B (21 August 2009); https://doi.org/10.1117/12.824202
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KEYWORDS
Silicon carbide

Polishing

X-rays

Wavefronts

Surface finishing

Metrology

Fringe analysis

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