Advanced x-ray optics with Si wafers and slumped glass

R. Hudec; V. Marsikova; M. Mika; J. Sik; M. Lorenc; L. Pina; A. Inneman; M. Skulinova

doi:10.1117/12.827978

31 August 2009 Advanced x-ray optics with Si wafers and slumped glass

R. Hudec, V. Marsikova, M. Mika, J. Sik, M. Lorenc, L. Pina, A. Inneman, M. Skulinova

Proceedings Volume 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV; 74370S (2009) https://doi.org/10.1117/12.827978
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

We report on the continuation of the development of test samples of astronomical x-ray optics based on thermally formed glass foils and on bent Si wafers. Experiments with thermal glass forming have continued adding wider range of evaluated and optimized parameters including viscosity and internal stress analyses, as well as investigation of mounting influences. Experiments with Si wafers focused on their quality improvements such as flatness and thickness uniformity in order to better meet the requirements of future X-ray astronomy projects applications, as well as on study of their surface quality, defects analysis, and methods for its reproducible measurement.

Citation Download Citation

R. Hudec, V. Marsikova, M. Mika, J. Sik, M. Lorenc, L. Pina, A. Inneman, and M. Skulinova "Advanced x-ray optics with Si wafers and slumped glass", Proc. SPIE 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV, 74370S (31 August 2009); https://doi.org/10.1117/12.827978

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