Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)

Hiroaki Oizumi; Kazuyuki Matsumaro; Julius Santillan; Toshiro Itani

doi:10.1117/12.846269

22 March 2010 Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)

Hiroaki Oizumi, Kazuyuki Matsumaro, Julius Santillan, Toshiro Itani

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76362W (2010) https://doi.org/10.1117/12.846269
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

This paper summarizes the investigation of the evaluation methods of EUV resist outgassing based on pressure-rise, gas chromatography mass spectrometry (GC-MS) and quadrupole mass spectrometry (QMS). We discuss the merit and demerit about these three methods and propose an optimal employment of each evaluation method. In addition, detail results of resist outgassing evaluated from GC-MS were reported.

Citation Download Citation

Hiroaki Oizumi, Kazuyuki Matsumaro, Julius Santillan, and Toshiro Itani "Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362W (22 March 2010); https://doi.org/10.1117/12.846269

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