Paper
23 August 2010 Rutherford backscattering and optical studies for ZnO thin films on sapphire substrates grown by metalorganic chemical vapor deposition
Yee Ling Chung, Lin Li, Shude Yao, Zhe Chuan Feng, William E. Fenwick, Tahir Zaidi, Ian T. Ferguson, Weijie Lu
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Abstract
A series of ZnO thin films with different thicknesses grown on sapphire substrates by metalorganic chemical vapor deposition (MOCVD) have been studied by different characterization techniques. The optical properties are investigated by photoluminescence (PL), optical transmission (OT) and 1st order derivatives, various angle scanning ellipsometry (VASE). Rutherford Backscattering (RBS) shows the atomic Zn:O ratios with a few percentage aviation from 1:1, and thicknesses in range of 10~230 nm, roughness layer with 10~30nm, which are corresponding to results from atomic force microscopy (AFM), and scanning electron microscopy (SEM). The optical and structure characterization measurements have confirmed the good quality of these epitaxial ZnO materials.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yee Ling Chung, Lin Li, Shude Yao, Zhe Chuan Feng, William E. Fenwick, Tahir Zaidi, Ian T. Ferguson, and Weijie Lu "Rutherford backscattering and optical studies for ZnO thin films on sapphire substrates grown by metalorganic chemical vapor deposition", Proc. SPIE 7784, Tenth International Conference on Solid State Lighting, 778416 (23 August 2010); https://doi.org/10.1117/12.859109
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KEYWORDS
Zinc oxide

Sapphire

Scanning electron microscopy

Thin films

Atomic force microscopy

Metalorganic chemical vapor deposition

Transmittance

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