Laser damage threshold results for sputtered coatings produced using different deposition technologies

Peter MacKay; Steve Wakeham; Mike Wilde; James Dutson; John Allen

doi:10.1117/12.899118

22 November 2011 Laser damage threshold results for sputtered coatings produced using different deposition technologies

Peter MacKay, Steve Wakeham, Mike Wilde, James Dutson, John Allen

Proceedings Volume 8190, Laser-Induced Damage in Optical Materials: 2011; 819006 (2011) https://doi.org/10.1117/12.899118
Event: SPIE Laser Damage, 2011, Boulder, Colorado, United States

Abstract

A new sputter deposition process has been developed based upon remote generation of plasma by a dedicated Plasma Source (PLS). This technique is referred to as high target utilisation sputtering (HiTUS). In contrast to ion beam and magnetron sputtering processes, HiTUS allows fast deposition rates of low stress, high density films from a high percentage (>90%) of the target surface. The process has not previously been applied to thin films for high laser damage threshold applications. The paper will present results of the anti-reflection (AR) coating trials and compare them to two other coating deposition processes - standard e-beam evaporation and hollow cathode ion-assisted e-beam deposition.

Citation Download Citation

Peter MacKay, Steve Wakeham, Mike Wilde, James Dutson, and John Allen "Laser damage threshold results for sputtered coatings produced using different deposition technologies", Proc. SPIE 8190, Laser-Induced Damage in Optical Materials: 2011, 819006 (22 November 2011); https://doi.org/10.1117/12.899118

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