Paper
23 December 2011 Characterization and applications of plasmon fields in metal nanostructures
Andreas Kolloch, Daniel Benner, Matthias Bädicker, Reimar Waitz, Tobias Geldhauser, Johannes Boneberg, Paul Leiderer, Elke Scheer
Author Affiliations +
Proceedings Volume 8204, Smart Nano-Micro Materials and Devices; 820404 (2011) https://doi.org/10.1117/12.911835
Event: SPIE Smart Nano + Micro Materials and Devices, 2011, Melbourne, Australia
Abstract
The excitation of plasmons in metallic nanostructures by light can give rise to pronounced local optical field enhancement with respect to the incident electromagnetic field. The details of these optical near fields depend sensitively on the properties of the nanostructures (material, size and shape), on the light wavelength and polarization, and also on the substrate. In this article we discuss several of these aspects influencing the near-field distribution for a given object and the resulting surface ablation by optical near fields. To this end we use both experimental and simulation techniques. Additionally we will present first results of experiments investigating the light emitted during nanoscale ablation. Finally, we will present an example how plasmon-mediated near-field effects act on the conductance of atomic-size contacts.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreas Kolloch, Daniel Benner, Matthias Bädicker, Reimar Waitz, Tobias Geldhauser, Johannes Boneberg, Paul Leiderer, and Elke Scheer "Characterization and applications of plasmon fields in metal nanostructures", Proc. SPIE 8204, Smart Nano-Micro Materials and Devices, 820404 (23 December 2011); https://doi.org/10.1117/12.911835
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Cited by 5 scholarly publications.
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KEYWORDS
Nanostructures

Near field

Plasmons

Metals

Near field optics

Current controlled current source

Electromagnetism

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