Study on stress birefringence measurement of uni-axial crystal

Xiaohong Wei; Liqun Chai; Qiang Li; Bo Gao

doi:10.1117/12.2002560

15 October 2012 Study on stress birefringence measurement of uni-axial crystal

Xiaohong Wei, Liqun Chai, Qiang Li, Bo Gao

Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84172R (2012) https://doi.org/10.1117/12.2002560
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Residual stress birefringence in crystal will affect frequency conversion efficiency and beam quality. In this paper the distribution characteristics of inherent stress birefringence in crystal is analyzed, through delicate adjustment the optical axis is oriented and qualitative results obtained for KDP crystals are presented and discussed by imaging digital stress measurement instrument, and the stress gradient distribution is calculated, also the effect of deviation from optical axis on the measured stress distribution results is discussed.

Citation Download Citation

Xiaohong Wei, Liqun Chai, Qiang Li, and Bo Gao "Study on stress birefringence measurement of uni-axial crystal", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172R (15 October 2012); https://doi.org/10.1117/12.2002560

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