Applying field mapping refractive beam shapers to improve irradiation of photocathode of FEL

Alexander Laskin; Vadim Laskin

doi:10.1117/12.930274

19 October 2012 Applying field mapping refractive beam shapers to improve irradiation of photocathode of FEL

Alexander Laskin, Vadim Laskin

Proceedings Volume 8504, X-Ray Free-Electron Lasers: Beam Diagnostics, Beamline Instrumentation, and Applications; 85040N (2012) https://doi.org/10.1117/12.930274
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

Providing the flattop (uniform) or other intensity distributions of short-pulse laser beam by irradiating photocathode of FEL is a technique that is frequently considered as a way to improve performance of FEL. This task can be easily solved with using beam shaping optics, for example, the field mapping refractive beam shapers like piShaper. The operational principle of these devices presumes transformation of laser beam intensity from Gaussian to flattop one with high flatness of output wavefront, saving of beam consistency, providing collimated output beam of low divergence, high transmittance, extended depth of field, negligible residual wave aberration, and achromatic design provides capability to work with ultra-short pulse lasers having broad spectrum. With using the same piShaper it is possible to realize various beam profiles like flattop, inverse Gauss or super Gauss by simple variation of input beam diameter; this feature makes these devices a powerful tool in reaching various effects of generation of an electron beam. This paper will describe some design basics of refractive beam shapers of the field mapping type and optical layouts of their applying in systems of FEL photocathode irradiation. Examples of real implementations and experimental results will be presented as well.

Citation Download Citation

Alexander Laskin and Vadim Laskin "Applying field mapping refractive beam shapers to improve irradiation of photocathode of FEL", Proc. SPIE 8504, X-Ray Free-Electron Lasers: Beam Diagnostics, Beamline Instrumentation, and Applications, 85040N (19 October 2012); https://doi.org/10.1117/12.930274

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