Ion beam sputtered Y2O3

D. Patel; P. F. Langston; L. M. Imbler; L. A. Emmert; A. S. Markosyan; R. Route; M. M Fejer; W. Rudolph; C. S. Menoni

doi:10.1117/12.976808

4 December 2012 Ion beam sputtered Y₂O₃

D. Patel, P. F. Langston, L. M. Imbler, L. A. Emmert, A. S. Markosyan, R. Route, M. M Fejer, W. Rudolph, C. S. Menoni

Proceedings Volume 8530, Laser-Induced Damage in Optical Materials: 2012; 85300Z (2012) https://doi.org/10.1117/12.976808
Event: SPIE Laser Damage, 2012, Boulder, Colorado, United States

Abstract

We have investigated the ion beam sputtering (IBS) of Y₂O₃ as an alternative to HfO₂ for high index layers in interference coatings for high power lasers. We present results on structural and optical properties of Y₂O₃ deposited from an oxide target. The IBS Y₂O₃ films are amorphous with a surface roughness of <6 Å for λ/4 thickness at 1 μm. The Y₂O₃ films are transparent with extremely low absorption loss at 1 μm and laser damage is in the range 10 J/cm² when tested at a wavelength of 1.03 μm and pulse duration of 375 ps.

Citation Download Citation

D. Patel, P. F. Langston, L. M. Imbler, L. A. Emmert, A. S. Markosyan, R. Route, M. M Fejer, W. Rudolph, and C. S. Menoni "Ion beam sputtered Y₂O₃", Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300Z (4 December 2012); https://doi.org/10.1117/12.976808

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