Study of photothermal response in thin film coatings by ellipsometry

Jingtao Dong; Jian Chen; Zhouling Wu

doi:10.1117/12.2020445

9 July 2013 Study of photothermal response in thin film coatings by ellipsometry

Jingtao Dong, Jian Chen, Zhouling Wu

Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 87861A (2013) https://doi.org/10.1117/12.2020445
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China

Abstract

Photothermal response is a process in which the absorption of optical wave in a sample will induce a temperature rise, hence a modification of the refractive index of the sample. By detecting the change of the refractive index, the absorption property of the sample can be obtained. In this paper, an ellipsometric study of the photothermal response is presented. By analyzing the polarization change of the probe beam caused by the pump beam through photothermal response, we can obtain the surface absorption property of the samples we are interested in. Our results indicate that this technique is very promising for the analysis of weak absorption in thin film coatings.

Citation Download Citation

Jingtao Dong, Jian Chen, and Zhouling Wu "Study of photothermal response in thin film coatings by ellipsometry", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 87861A (9 July 2013); https://doi.org/10.1117/12.2020445

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