Refractive index of thin films realized by Satisloh SP reactive sputtering system

Gianni Monaco; Arturo Colautti; Cristina Allegro; Tom Godin; Steffan Gold; Michael Witzany

doi:10.1117/12.2030474

15 October 2013 Refractive index of thin films realized by Satisloh SP reactive sputtering system

Gianni Monaco, Arturo Colautti, Cristina Allegro, Tom Godin, Steffan Gold, Michael Witzany

Proceedings Volume 8884, Optifab 2013; 88841B (2013) https://doi.org/10.1117/12.2030474
Event: SPIE Optifab, 2013, Rochester, New York, United States

Abstract

Pulsed DC reactive sputtering is a very interesting technique for coating applications. Reactive sputtering can give very dense layers, low stress of the deposited multilayer film, high reproducibility, very high hardness (up to 1200 Vickers hardness) with unbeatable high rates ideal for industrial applications. SP-100 is Satisloh reactive sputtering systems with only one target material but can deposit various film materials simply by using different gases such as argon, as well as the reactive gases nitrogen and oxygen. Silicon-oxides, silicon-nitrides and all kinds of silicon-oxy-nitrides (SiO_x-Si_xO_yN_z-Si_xN_y) with a refractive index range of 1.44-2.05 in the visible range can be obtained. In the reactive sputtering the material it is usually deposited in the so called “transition mode” where it must be found the correct equilibrium point between the target voltage and the reactive gas flow. The transition mode assures a dense film with a stable rate. Condition to find such equilibrium point is given by the so called “material hysteresis” in which the target voltage is depicted in function of the reactive gas voltage. The hysteresis and the consequent equilibrium point are strongly depended by the power supplied to the target and the inert gas (argon) flow which could affect the optical characteristics and the deposition rate. We checked the refractive indexes of the SiO_x and Si_xN_y of very thin (1 QW Optical thickness at 520 nm) and thicker (3, 5 and 9 QW @520 nm) reporting how the different conditions can affect the refractive index and the deposition rate of the different materials.

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Gianni Monaco, Arturo Colautti, Cristina Allegro, Tom Godin, Steffan Gold, and Michael Witzany "Refractive index of thin films realized by Satisloh SP reactive sputtering system", Proc. SPIE 8884, Optifab 2013, 88841B (15 October 2013); https://doi.org/10.1117/12.2030474

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KEYWORDS

Refractive index

Sputter deposition

Argon

Silicon

Thin films

Quantum wells

Coating

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