Application of time-resolved digital holographic microscopy to study femtosecond damage process in thin films

Nerijus Šiaulys; Laurent Gallais; Andrius Melninkaitis

doi:10.1117/12.2030351

14 November 2013 Application of time-resolved digital holographic microscopy to study femtosecond damage process in thin films

Nerijus Šiaulys, Laurent Gallais, Andrius Melninkaitis

Author Affiliations +

Proceedings Volume 8885, Laser-Induced Damage in Optical Materials: 2013; 88851A (2013) https://doi.org/10.1117/12.2030351
Event: SPIE Laser Damage, 2013, Boulder, Colorado, United States

Abstract

An imaging of strongly excited thin film dielectric coating is done by the means of femtosecond time-resolved off-axis digital holography (TRDH). Ta₂O₅ single layer coating have been investigated at different time moments in transmission mode. The evolving damage process was recorded in series of microscopic amplitude and phase contrast images. Different processes were found to occur and namely: Kerr effect, free-electron generation, ultrafast lattice heating and shock wave generation. The trends in electronic contribution are qualitatively reproduced by the theoretical model while the other effects require additional studies.

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Nerijus Šiaulys, Laurent Gallais, and Andrius Melninkaitis "Application of time-resolved digital holographic microscopy to study femtosecond damage process in thin films", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 88851A (14 November 2013); https://doi.org/10.1117/12.2030351

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