Paper
19 November 2013 Improvements in the laser damage behavior of Ta2O5/SiO2 interference coatings by modification of the top layer design
D. Patel, D. Schiltz, P. F. Langton, L. Emmert, L. N. Acquaroli, C. Baumgarten, B. Reagan, J. J. Rocca, W. Rudolph, A. Markosyan, R. R. Route, M. Fejer, C. S. Menoni
Author Affiliations +
Abstract
We have investigated the properties and laser damage behavior of Ta2O5/SiO2 quarter wave stacks designed for λ=1 μm operation by substituting the Ta2O5 layer by either Y2O3 or HfO2 and the SiO2 by Al2O3 in the top 3 pairs of the multilayer stack. The high reflectors were deposited by dual ion beam sputtering. Laser damage at 1 μm using 350 ps showed enhanced performance when the Ta2O5/SiO2 stack had HfO2 or Y2O3 in its top few pairs.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Patel, D. Schiltz, P. F. Langton, L. Emmert, L. N. Acquaroli, C. Baumgarten, B. Reagan, J. J. Rocca, W. Rudolph, A. Markosyan, R. R. Route, M. Fejer, and C. S. Menoni "Improvements in the laser damage behavior of Ta2O5/SiO2 interference coatings by modification of the top layer design", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888522 (19 November 2013); https://doi.org/10.1117/12.2030380
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Cited by 6 scholarly publications.
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KEYWORDS
Laser induced damage

Reflectors

Silica

Scattering

Absorption

Multilayers

Picosecond phenomena

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