Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt; Sunglin Wang; Lee Johnson; Melissa Zaverton; Tao Ge; Tom Milster; Yuzuru Takashima

doi:10.1117/12.2045234

7 March 2014 Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII; 89740C (2014) https://doi.org/10.1117/12.2045234
Event: SPIE MOEMS-MEMS, 2014, San Francisco, California, United States

Abstract

We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.

Citation Download Citation

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, and Yuzuru Takashima "Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits", Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 89740C (7 March 2014); https://doi.org/10.1117/12.2045234

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