UV-LED exposure system for low-cost photolithography

Murat Kaya Yapici; Ilyas Farhat

doi:10.1117/12.2046123

31 March 2014 UV-LED exposure system for low-cost photolithography

Murat Kaya Yapici, Ilyas Farhat

Proceedings Volume 9052, Optical Microlithography XXVII; 90521T (2014) https://doi.org/10.1117/12.2046123
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

This paper reports the development of a low-cost, portable, light-emitting diode (LED)-based UV exposure system for photolithography. The major system components include UV-LEDs, microcontroller, digital-to-analog (D/A) converter and LED control circuitry. The UV-LED lithography system is also equipped with a digital user interface (LCD and keypad) and permits accurate electronic control on the exposure time and power. Hence the exposure dose can be varied depending on process requirements. Compared to traditional contact lithography, the UV-LED lithography system is significantly cheaper, simple to construct using off-the shelf components and does not require complex infrastructure to operate. Such reduction in system cost and complexity renders UV-LED lithography as a perfect candidate for micro lithography with large process windows typically suitable for MEMS, microfluidics applications.

Citation Download Citation

Murat Kaya Yapici and Ilyas Farhat "UV-LED exposure system for low-cost photolithography", Proc. SPIE 9052, Optical Microlithography XXVII, 90521T (31 March 2014); https://doi.org/10.1117/12.2046123

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