"Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist

Konoe Miura; Tameichi Ochiai; Yasuhiro Kameyama; Chie Kashi; Shigeo Uoya; Masayuki Nakajima; Akira Kawai; Shinji Kishimura

doi:10.1117/12.968311

1 January 1988 "Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist

Konoe Miura, Tameichi Ochiai, Yasuhiro Kameyama, Chie Kashi, Shigeo Uoya, Masayuki Nakajima, Akira Kawai, Shinji Kishimura

Author Affiliations +

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968311
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Two new concepts,"masking effect" and "internal CEL", are proposed to design a high resolution quinonediazide-novolak type photoresist. On the basis of these two design concepts, we optimized the composition of the resist, and succeeded in developing a high resolution resist, which is composed of m-cresol/p-cresol/xylenol/formaldehyde novolak resin and 2 ,3 ,4 , 4' -tetrahydroxybenzophenone 1 , 2 -naphtoquinonediaz ide-5 -sulfonate. This resist can resolve as small as 0.6 um lines & spaces with aspect ratio of 2.7 (NA.0.42) and has the gamma value of 2.0.

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Konoe Miura, Tameichi Ochiai, Yasuhiro Kameyama, Chie Kashi, Shigeo Uoya, Masayuki Nakajima, Akira Kawai, and Shinji Kishimura ""Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968311

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