Paper
2 September 2015 Q-switched 1064nm laser source for photomechanical ablation in obsidianus lapis
A. I. Aguilar-Morales, J. A. Álvarez-Chávez, A. J. Morales-Ramírez, Michael Panzner, M. A. Ortega-Delgado
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Abstract
The process of ablation in obsidianus lapis is mainly governed by pulse energy from the laser source and scanning speed. The rate of material ablation is influenced by chemical and physical properties. In this work, laser energy at 1064 nm, has been used for ablation behavior in Q-switch regime. A >40 W, average power Nd:YAG source with pulse energies ranging from 3mJ to nearly 7 mJ, achieved surface damages up to 160 μm of depth. Photo-mechanical ablation in terms of scan speed showed a maximum depth of nearly 500 μm at 130 mm/s. The maximum pulse energy of 12 mJ resulted in ablation of 170 μm depth. Highly efficient ablation in obsidianus lapis for artistic work is an interesting field of application.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. I. Aguilar-Morales, J. A. Álvarez-Chávez, A. J. Morales-Ramírez, Michael Panzner, and M. A. Ortega-Delgado "Q-switched 1064nm laser source for photomechanical ablation in obsidianus lapis", Proc. SPIE 9573, Optomechanical Engineering 2015, 95730O (2 September 2015); https://doi.org/10.1117/12.2185600
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KEYWORDS
Laser ablation

Refractive index

Glasses

Data modeling

Absorption

Diffusion

Q switched lasers

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