Paper
2 May 2016 Multilayers for EUV, soft x-ray and x-ray optics
Author Affiliations +
Abstract
Driven by the requirements in synchrotron radiation applications, astronomical observation, and dense plasma diagnostics, the EUV, soft X-rays and X-rays multilayer optics have been tremendously developed. Based on the LAMP project for soft X-ray polarimetry, Co/C and Cr/C multilayers have been fabricated and characterized. Both Co/C and Cr/C multilayers reveal good optical performance working at 250 eV. Pd/Y multilayers have been successfully fabricated using reactive sputtering with nitrogen working at around 9.4 nm. EUV normal incidence Schwarzschild and soft X-ray grazing incidence KB microscopes were developed for ICF plasma diagnostics. This paper covers the outline of the multilayer optics and the current status in our lab.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhanshan Wang, Qiushi Huang, and Zhong Zhang "Multilayers for EUV, soft x-ray and x-ray optics", Proc. SPIE 9747, Terahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications IX, 97471K (2 May 2016); https://doi.org/10.1117/12.2218081
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KEYWORDS
X-rays

Reflectivity

Multilayers

Microscopes

Nitrogen

Extreme ultraviolet

X-ray optics

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