Monolithic subwavelength gratings integrated with metal (metalMHCG) enable nearly total transmission of light and can be fabricated with common semiconductor materials, however, they require a very high-aspect ratio between height and period of the metalMHCG stripes which is technologically challenging. This study aims the optimization of metalMHCG fabrication procedure by plasma etching taking into account the influence of process gas flow, their composition, pressure, power, and temperature on the wall shape of metaMHCG, etch rate, and etch selectivity. In the result, metalMHCG with high-aspect ratio and dimensions enabling nearly total transmission are fabricated.
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