Presentation
9 March 2024 Fabrication of monolithic subwavelength high-aspect ratio GaAs gratings integrated with metal for transmission of unpolarized infrared light
Author Affiliations +
Abstract
Monolithic subwavelength gratings integrated with metal (metalMHCG) enable nearly total transmission of light and can be fabricated with common semiconductor materials, however, they require a very high-aspect ratio between height and period of the metalMHCG stripes which is technologically challenging. This study aims the optimization of metalMHCG fabrication procedure by plasma etching taking into account the influence of process gas flow, their composition, pressure, power, and temperature on the wall shape of metaMHCG, etch rate, and etch selectivity. In the result, metalMHCG with high-aspect ratio and dimensions enabling nearly total transmission are fabricated.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karolina Bogdanowicz, Weronika Glowadzka, Oskar Sadowski, Tristan Smolka, Michal Rygala, Marcin Motyka, Marek Ekielski, Tomasz Czyszanowski, and Anna Szerling "Fabrication of monolithic subwavelength high-aspect ratio GaAs gratings integrated with metal for transmission of unpolarized infrared light", Proc. SPIE PC12895, Quantum Sensing and Nano Electronics and Photonics XX, PC128951C (9 March 2024); https://doi.org/10.1117/12.3000495
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KEYWORDS
Optical gratings

Fabrication

Gallium arsenide

Infrared radiation

Metals

Polarized light

Etching

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