Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich

Harry Levinson

doi:10.1117/1.JMM.23.2.020701

3 April 2024 Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich

Harry Levinson

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Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 2, 020701 (April 2024). https://doi.org/10.1117/1.JMM.23.2.020701

Abstract

Tatiana Kovalevich of imec discusses her recent paper, Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask, with JM³ Editor-in-Chief Harry Levinson.

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Harry Levinson "Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich," Journal of Micro/Nanopatterning, Materials, and Metrology 23(2), 020701 (3 April 2024). https://doi.org/10.1117/1.JMM.23.2.020701

Published: 3 April 2024

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KEYWORDS

Optical lithography

Printing

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