Subwavelength interference nanolithography based on metallic–insulator–metallic waveguide with a trapezoid metallic nanoslit coupler

Shuxia Zhang; Xuefeng Yang; Weiyang Yu; Baoji Wang; Xiaolin Cai; Liwei Zhang; Xiaohua Li; Xingtao Jia; Jian Wang; Xiaoxia Zhao

doi:10.1117/1.JNP.13.026006

7 May 2019 Subwavelength interference nanolithography based on metallic–insulator–metallic waveguide with a trapezoid metallic nanoslit coupler

Shuxia Zhang, Xuefeng Yang, Weiyang Yu, Baoji Wang, Xiaolin Cai, Liwei Zhang, Xiaohua Li, Xingtao Jia, Jian Wang, Xiaoxia Zhao

Author Affiliations +

Journal of Nanophotonics, Vol. 13, Issue 2, 026006 (May 2019). https://doi.org/10.1117/1.JNP.13.026006

Abstract

A subwavelength interference nanolithography scheme is numerically demonstrated based on a metallic–insulator–metallic waveguide combined with unidirectional couplers. The coupler is a single right-angled (or left-angled) trapezoid metallic nanoslit that can carry out efficient unidirectional generation of surface plasmon polaritons under normal incidence. Simulation results show that a feature size to 50 nm half-pitch uniformity pattern can be obtained at the working wavelength of 365 nm with the proposed scheme. This proposed scheme can enhance the intensity of the interference pattern with higher contrast and field depth and is advantageous for the fabrication process in practical applications.

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Shuxia Zhang, Xuefeng Yang, Weiyang Yu, Baoji Wang, Xiaolin Cai, Liwei Zhang, Xiaohua Li, Xingtao Jia, Jian Wang, and Xiaoxia Zhao "Subwavelength interference nanolithography based on metallic–insulator–metallic waveguide with a trapezoid metallic nanoslit coupler," Journal of Nanophotonics 13(2), 026006 (7 May 2019). https://doi.org/10.1117/1.JNP.13.026006

Received: 23 January 2019; Accepted: 16 April 2019; Published: 7 May 2019

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