Superimposed grating wavelength division multiplexing in Ge-doped SiO2/Si planar waveguides

Andreas Othonos; J. Bismuth; M. Sweeny; Antoine P. Kevorkian; Jing Ming Xu

doi:10.1117/1.601873

1 February 1998 Superimposed grating wavelength division multiplexing in Ge-doped SiO2/Si planar waveguides

Andreas Othonos, J. Bismuth, M. Sweeny, Antoine P. Kevorkian, Jing Ming Xu

Optical Engineering, Vol. 37, Issue 2, (February 1998). https://doi.org/10.1117/1.601873

An improved model of wavelength division multiplexing (WDM) by superimposed gratings in planar waveguides has been developed. Based on this theory, principal design rules of N-channel WDM are established and a fanout capacity of 100 is estimated. Finally, fourchannel WDM at 840 nm has been demonstrated on a Ge:SiO2 /SiO2 /Si planar waveguide, which was hydrogenated to enhance its photosensitivity. The superimposed gratings were written using a narrow linewidth KrF excimer laser in an interferometric setup used in inscribing fiber Bragg gratings.

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Andreas Othonos, J. Bismuth, M. Sweeny, Antoine P. Kevorkian, and Jing Ming Xu "Superimposed grating wavelength division multiplexing in Ge-doped SiO2/Si planar waveguides," Optical Engineering 37(2), (1 February 1998). https://doi.org/10.1117/1.601873

Published: 1 February 1998

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