7 July 2021 Focusing characteristics of graded photonic crystal waveguide lens based on interference lithography
Yongle Qi, Kangping Liu, Shuai Wang, Deli Chen, XiaoHong Sun
Author Affiliations +
Abstract

Using multi-beam interferometry, a photonic structure with a graded intensity distribution is designed and obtained experimentally. Based on the structure, we choose different exposure thresholds and background materials to design a graded photonic crystal (GPC) lens with a graded air hole diameter. The transmission and focusing characteristics of the GPC lens with bismuth silicate crystal (BSO) and polymethyl methacrylate (PMMA) as background materials are investigated in the visible-light band. Comparatively speaking, the graded photonic crystal lens of BSO with a large refractive index had better performance. In addition, the focal intensity does not decrease significantly with increasing the angle of incidence. The focus point intensity remains above 93% of parallel incidence for both lenses.

© 2021 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2021/$28.00 © 2021 SPIE
Yongle Qi, Kangping Liu, Shuai Wang, Deli Chen, and XiaoHong Sun "Focusing characteristics of graded photonic crystal waveguide lens based on interference lithography," Optical Engineering 60(7), 077102 (7 July 2021). https://doi.org/10.1117/1.OE.60.7.077102
Received: 31 March 2021; Accepted: 22 June 2021; Published: 7 July 2021
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Cited by 4 scholarly publications.
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KEYWORDS
Photonic crystals

Polymethylmethacrylate

Refractive index

Waveguides

Lithography

Polarization

Transmittance

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