Mr. Andrew Wee Profile

Andrew Wee

Director, Surface Sci Lab

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 24 October 2000 Paper

Use of sample rotation in SIMS profiling of Ta barrier layers to Cu diffusion

Rong Liu, Andrew Wee, L. Liu, G. Hao

Proceedings Volume 4227, (2000) https://doi.org/10.1117/12.405375

KEYWORDS: Copper, Tantalum, Diffusion, Silicon, Profiling, Statistical analysis, Oxygen, Multilayers, Metals, Ions

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Proceedings Article | 24 October 2000 Paper

Ultrashallow depth profiling of B deltas in Si using a CAMECA IMS 6f

Chee Mang Ng, Andrew Wee, C. H. Alfred Huan, Alex See

Proceedings Volume 4227, (2000) https://doi.org/10.1117/12.405374

KEYWORDS: Sputter deposition, Oxygen, Profiling, Ions, Surface roughness, Ion beams, Silicon, Boron, Cerium, Oxides

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Proceedings Article | 24 October 2000 Paper

Behavior of Ta thin film as a diffusion barrier in the Cu/barrier/SiO2 system

Ji Sheng Pan, Andrew Wee, C. H. Alfred Huan, Jian Wei Chai

Proceedings Volume 4227, (2000) https://doi.org/10.1117/12.405381

KEYWORDS: Tantalum, Copper, Interfaces, Silicon, Diffusion, Annealing, Thin films, Scanning electron microscopy, Oxides, Chemical species

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Proceedings Article | 24 October 2000 Paper

Effect of flash copper on Cu diffusion

Dao Hua Zhang, Seow Loh, Chao Yong Li, Rong Liu, Andrew Wee, L. Zhang, Y. Lee

Proceedings Volume 4227, (2000) https://doi.org/10.1117/12.405390

KEYWORDS: Copper, Annealing, Chemical vapor deposition, Silicon, Diffusion, Resistance, Metalorganic chemical vapor deposition, Metals, Chemical species, Tantalum

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Proceedings Article | 24 October 2000 Paper

Application of excimer laser annealing in the formation of ultrashallow p+/n junctions

Yung Fu Chong, Kin Pey, Andrew Wee, Alex See, C. Tung, R. Gopalakrishnan, Yongfeng Lu

Proceedings Volume 4227, (2000) https://doi.org/10.1117/12.405380

KEYWORDS: Annealing, Silicon, Boron, Semiconductor lasers, Excimer lasers, Ion implantation, Laser irradiation, Diffusion, Pulsed laser operation, Optical simulations

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Proceedings Article | 23 October 2000 Paper

CVD Cu/IMP Cu/TaN/SiO2/Si structures

Seow Loh, Dao Hua Zhang, Chao Yong Li, Rong Liu, Andrew Wee

Proceedings Volume 4229, (2000) https://doi.org/10.1117/12.404876

KEYWORDS: Copper, Silicon, Annealing, Metalorganic chemical vapor deposition, Crystals, Chemical vapor deposition, Resistance, Metals, Diffusion, Chemical species

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Proceedings Article | 9 November 1999 Paper

Comparative investigation of high-resolution transmission electron microscopy and Fourier transform infrared spectroscopy for GaN films on sapphire substrate

Kun Li, Yong Hou, Zhe Chuan Feng, Soo-Jin Chua, Ming Fu Li, Ernest Lau, Andrew Wee

Proceedings Volume 3899, (1999) https://doi.org/10.1117/12.369444

KEYWORDS: Gallium nitride, Transmission electron microscopy, Reflectivity, Interfaces, Sapphire, FT-IR spectroscopy, Atomic force microscopy, Silicon, Diffraction, Infrared radiation

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Showing 5 of 7 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 24 October 2000

Advanced Microelectronic Processing Techniques

Conference Committee Involvement (1)

Advanced Microelectronic Processing Techniques

28 November 2000 | Singapore, Singapore

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