Mr. Ben S. Routley Profile

Ben S. Routley

at Univ of Newcastle

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Author

Publications (2)

SPIE Journal Paper | 8 September 2017

Gradient-based optimization for efficient exposure planning in maskless lithography

Omid Ghalehbeygi, Adrian Wills, Ben Routley, Andrew Fleming

JM3, Vol. 16, Issue 03, 033507, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033507

KEYWORDS: Photoresist materials, Maskless lithography, Lithography, Convolution, Optimization (mathematics), Photoresist developing, Process modeling, Matrices, Model-based design, Optical simulations

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Proceedings Article | 19 March 2015 Paper

Optimization of near-field scanning optical lithography

Ben Routley, John Holdsworth, Andrew Fleming

Proceedings Volume 9423, 94230F (2015) https://doi.org/10.1117/12.2086073

KEYWORDS: Photoresist materials, Coating, Absorption, 3D modeling, Optical lithography, Near field scanning optical microscopy, Computer simulations, Near field optics, Lithography, Aluminum

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