Ms. Ge Gao Profile

Ge Gao

at Sun Yat-sen University

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 15 October 2015 Paper

Interlaced semi-ellipsoid nanostructures for improving light trapping of ultrathin crystalline silicon solar cells

Ge Gao, Juntao Li, Xuehua Wang

Proceedings Volume 9672, 96720H (2015) https://doi.org/10.1117/12.2199336

KEYWORDS: Absorption, Refractive index, Silicon, Nanostructures, Solar cells, Antireflective coatings, Reflection, Crystals, Silicon solar cells, Nanolithography

Read Abstract +

Ultrathin crystalline silicon (c-Si) solar cells, which are of several micrometers thick, have attracted much attention in recent years, since it can greatly save raw materials than the traditional ones. To enhance the absorption, as well as to improve the cell efficiency, of the ultrathin c-Si, light trapping nanostructures are used to increase the effective absorption length to close to the 4n² of the materials thickness, which is determined by the Lambertian limit. Here, we propose a novel interlaced semi-ellipsoid nanostructures (ISENs) to improve the performance of ultrathin c-Si solar cells. In this structure, the large and small periods in x and y direction can improve the light trapping capability at long and short wavelengths respectively. Meanwhile, the graded refractive index of the surface can act as the antireflection coating. By optimizing the ISENs, the short circuit current density of 30.15mA/cm² was achieved by simulations for a 2 μm thick c-Si solar cell with r_x = 500 nm, r_y = 200 nm, r_z= 550 nm and without antireflection coating and metal back reflector. The absorption is close to 87% of the Lambertian limit with equivalent thickness. We expect this structure can be fabricated by low cost nanosphere lithography technology and used to improve the efficiency of the ultrathin c-Si solar cells.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years