Mr. Naonori Kita Profile

Naonori Kita

at Nikon Corp

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 31 March 2014 Paper

Paper

Scanner performance predictor and optimizer in further low-k1 lithography

Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama

Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547

KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

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SPIE Journal Paper | 2 December 2013 Open Access

Open Access

Impact of realistic source shape and flexibility on source mask optimization

Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama, Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui

JM3, Vol. 13, Issue 01, 011005, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011005

KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

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Proceedings Article | 12 April 2013 Paper

Paper

The impact of realistic source shape and flexibility on source mask optimization

Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui, Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830M (2013) https://doi.org/10.1117/12.2011353

KEYWORDS: Source mask optimization, Scanners, Optical proximity correction, Electroluminescence, Fiber optic illuminators, Photomasks, Critical dimension metrology, Semiconducting wafers, SRAF, Printing

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Proceedings Article | 12 April 2013 Paper

Paper

Global source optimization for MEEF and OPE

Ryota Matsui, Tomoya Noda, Hajime Aoyama, Naonori Kita, Tomoyuki Matsuyama, Donis Flagello

Proceedings Volume 8683, 86830O (2013) https://doi.org/10.1117/12.2008267

KEYWORDS: Photomasks, Optimization (mathematics), Image processing, Freeform optics, Semiconducting wafers, Optical proximity correction, Source mask optimization, Cadmium sulfide, Detection and tracking algorithms, Optics manufacturing

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Proceedings Article | 12 April 2013 Paper

Paper

Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography

Kazuya Fukuhara, Akiko Mimotogi, Takuya Kono, Hajime Aoyama, Taro Ogata, Naonori Kita, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830U (2013) https://doi.org/10.1117/12.2011691

KEYWORDS: Photomasks, Diffraction, Lithographic illumination, Ions, Neodymium, Semiconductors, Critical dimension metrology, Immersion lithography, Control systems, Lithography

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Proceedings Article | 12 April 2013 Paper

Paper

Illumination pupilgram control using an intelligent illuminator

Noriyuki Hirayanagi, Yasushi Mizuno, Masakazu Mori, Naonori Kita, Ryota Matsui, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830D (2013) https://doi.org/10.1117/12.2011077

KEYWORDS: Modulation, Fiber optic illuminators, Distortion, Scanners, Photomasks, 3D modeling, Software development, Optimization (mathematics), Optical proximity correction, Lithography

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Proceedings Article | 13 March 2012 Paper

Paper

Application of illumination pupilgram control method with freeform illumination

Tomoyuki Matsuyama, Naonori Kita, Ryota Matsui, Junji Ikeda

Proceedings Volume 8326, 83260K (2012) https://doi.org/10.1117/12.916594

KEYWORDS: Modulation, Fiber optic illuminators, Point spread functions, Optimization (mathematics), Distortion, Lithographic illumination, Source mask optimization, Scanners, Error analysis, Photomasks

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Source Mask Optimization1 (SMO) is one of the most important techniques available for extending ArF immersion lithography. The combination of freeform source shape and complex mask pattern, determined by SMO, can extend the practical resolution of a lithography system. However, imaging with a small k1 factor (~0.3 or smaller) is very sensitive to many imaging parameters, such as illumination source shape error, lens aberration, process property, etc. As a result, the real source shape must be re-adjusted to realize the expected imaging performance as may be seen, for example, in an Optical Proximity Effect (OPE) curve. In this paper we present an illumination pupilgram re-adjustment method that can effectively control the various illumination parameters to get optimum imaging performance, which is required for the lithography process design. The modulation functions are called Zernike intensity/distortion modulations2. Since the pupilgram modulation is expressed by Zernike polynomials3, a high degree of pupilgram adjustment freedom is provided to the intelligent illuminator4 (freeform illumination) which can be effectively modeled in the optimization. Furthermore, the magnitude of each adjusting Zernike component can be restricted to prevent over modulation, which may affect imaging performance for various patterns on a mask. Furthermore, the linear impact of each term of Zernike modulation can allow us to use Zernike linear combination analysis to calculate imaging performance. Therefore, optimization using a large variety of illumination modulation terms may be possible with reasonable computation loads. The method is combined with an imaging simulator that includes resist models and optimization algorithms in pupilgram refinement software called "OPE Master". The software can take into account the scanner signature and various constraints so that the result of the optimization can be accurately realized on the scanner. The optimization can be performed based on rigorous imaging simulation and Zernike linear combination analysis, which is based on a precalculated Zernike linear sensitivity table.

Proceedings Article | 5 October 2011 Paper

Paper

Illumination pupilgram prediction and control method in advanced optical lithography

Tomoyuki Matsuyama, Naonori Kita, Daniel Smith

Proceedings Volume 8171, 81710L (2011) https://doi.org/10.1117/12.899032

KEYWORDS: Modulation, Distortion, Fiber optic illuminators, Point spread functions, Source mask optimization, Lithographic illumination, Ray tracing, Lithography, Critical dimension metrology, Optical lithography

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Proceedings Article | 23 March 2011 Paper

Paper

Illuminator predictor for effective SMO solutions

Daniel Smith, Naonori Kita, Nobumichi Kanayamaya, Ryota Matsui, Shane Palmer, Tomoyuki Matsuyama, Donis Flagello

Proceedings Volume 7973, 797309 (2011) https://doi.org/10.1117/12.879116

KEYWORDS: Source mask optimization, Fiber optic illuminators, Point spread functions, Ray tracing, Lithographic illumination, Reticles, Critical dimension metrology, Lithography, Computer simulations, Imaging systems

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Proceedings Article | 23 March 2011 Paper

Paper

Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool

Tomoyuki Matsuyama, Naonori Kita, Yasushi Mizuno

Proceedings Volume 7973, 79731H (2011) https://doi.org/10.1117/12.879395

KEYWORDS: Modulation, Distortion, Fiber optic illuminators, Source mask optimization, Immersion lithography, Imaging systems, Error analysis, Photomasks, Zernike polynomials, Wavefront analysis

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Proceedings Article | 10 March 2010 Paper

Paper

Illumination optics for source-mask optimization

Yasushi Mizuno, Tomoyuki Matsuyama, Soichi Owa, Osamu Tanitsu, Naonori Kita, Masahiko Okumura

Proceedings Volume 7640, 76401I (2010) https://doi.org/10.1117/12.846476

KEYWORDS: Fiber optic illuminators, Source mask optimization, Resolution enhancement technologies, Modulation, Lithographic illumination, Photomasks, Optical lithography, Zernike polynomials, Immersion lithography, Double patterning technology

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Proceedings Article | 4 March 2010 Paper

Paper

Tolerancing analysis of customized illumination for practical applications of source and mask optimization

Tomoyuki Matsuyama, Naonori Kita, Toshiharu Nakashima, Osamu Tanitsu, Soichi Owa

Proceedings Volume 7640, 764007 (2010) https://doi.org/10.1117/12.846639

KEYWORDS: Modulation, Distortion, Source mask optimization, Tolerancing, Error analysis, Image processing, Optical lithography, Optical simulations, Fiber optic illuminators, Scanning electron microscopy

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SPIE Journal Paper | 1 October 2009

Residual speckle in a lithographic illumination system

Gregg Gallatin, Naonori Kita, Tomoko Ujike, William Partlo

JM3, Vol. 8, Issue 04, 043003, (October 2009) https://doi.org/10.1117/12.10.1117/1.3256007

KEYWORDS: Speckle, Diffractive optical elements, Speckle pattern, Reticles, Lithographic illumination, Fourier transforms, Fiber optic illuminators, Excimers, Line edge roughness, Semiconducting wafers

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Proceedings Article | 16 March 2009 Paper

Paper

Polarization aberration control for ArF projection lenses

Tomoyuki Matsuyama, Naonori Kita

Proceedings Volume 7274, 72741M (2009) https://doi.org/10.1117/12.813399

KEYWORDS: Polarization, Wave plates, Polarizers, Glasses, Optical components, Polarization control, Wavefronts, Lenses, Matrices, Ray tracing

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Proceedings Article | 27 March 2007 Paper

Paper

Polarization properties of state-of-art lithography optics represented by first canonical coordinate of Lie group

Toru Fujii, Yuji Kudo, Yasuhiro Ohmura, Kosuke Suzuki, Jun Kogo, Yasushi Mizuno, Naonori Kita, Masayasu Sawada

Proceedings Volume 6520, 65204W (2007) https://doi.org/10.1117/12.710784

KEYWORDS: Polarization, Matrices, Lithography, Birefringence, Projection systems, Optical lithography, Wavefronts, Crystals, Jones matrices, Signal attenuation

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Proceedings Article | 24 March 2006 Paper

Paper

Integrated projecting optics tester for inspection of immersion ArF scanner

Toru Fujii, Kosuke Suzuki, Yasushi Mizuno, Naonori Kita

Proceedings Volume 6152, 615237 (2006) https://doi.org/10.1117/12.656025

KEYWORDS: Polarization, Wavefronts, Scanners, Calibration, Optical testing, Sensors, Wavefront sensors, Charge-coupled devices, Integrated optics, Inspection

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Proceedings Article | 15 March 2006 Paper

Paper

Characterizing a scanner illuminator for prediction of OPE effects

Stephen Renwick, Hisashi Nishinaga, Naonori Kita

Proceedings Volume 6154, 61540O (2006) https://doi.org/10.1117/12.656810

KEYWORDS: Fiber optic illuminators, Optical transfer functions, Lithography, Optical proximity correction, Scanners, Manufacturing, Photomasks, Modulation transfer functions, Monochromatic aberrations, Reticles

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Proceedings Article | 10 May 2005 Paper

Paper

On board polarization measuring instrument for high NA excimer scanner

Toru Fujii, Naonori Kita, Yasushi Mizuno

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598378

KEYWORDS: Polarization, Polarimetry, Scanners, Fiber optic illuminators, Wave plates, Calibration, Excimers, Light sources, Digital signal processing, Polarization control

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Showing 5 of 18 publications

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