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Susumu Mori
Executive Staff at Nikon Corp
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 14 September 2001 Paper
Higher-NA ArF scanning exposure tool on new platform for further 100-nm technology node
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435762
KEYWORDS: Semiconducting wafers, Lithography, Wavefronts, Reticles, Excimer lasers, Control systems, Signal detection, Phase measurement, Interferometers, Lithographic illumination
Proceedings Article | 26 July 1999 Paper
Performance of the ArF scanning exposure tool
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354363
KEYWORDS: Lithography, Excimer lasers, Silica, Semiconducting wafers, Lithographic illumination, Calcium, Glasses, Light sources, 193nm lithography, Pulsed laser operation
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