PROCEEDINGS VOLUME 8701
PHOTOMASK AND NGL MASK TECHNOLOGY XX | 16-18 APRIL 2013
Photomask and Next-Generation Lithography Mask Technology XX
Editor(s): Kokoro Kato
Editor Affiliations +
IN THIS VOLUME

15 Sessions, 45 Papers, 0 Presentations, 0 Posters
Repair II  (2)
MDP and EDA  (6)
MDP  (6)
EUVL Masks I  (4)
EUVL Masks V  (4)
PHOTOMASK AND NGL MASK TECHNOLOGY XX
16-18 April 2013
Yokohama, Japan
Front Matter: Volume 8701
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870101 (2013) https://doi.org/10.1117/12.2032560
Writing Technologies
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870102 (2013) https://doi.org/10.1117/12.2030095
Hirofumi Hayakawa, Masahiro Takizawa, Masaki Kurokawa, Akiyoshi Tsuda, Masami Takigawa, Shin-ichi Hamaguchi, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870103 (2013) https://doi.org/10.1117/12.2029193
Material and Process
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870104 (2013) https://doi.org/10.1117/12.2027974
Hrishi Shende, Sherjang Singh, James Baugh, Uwe Dietze, Peter Dress
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870105 (2013) https://doi.org/10.1117/12.2029883
C. W. Shen, K. W. Lin, C. L. Lu, Luke Hsu, Angus Chin, Anthony Yen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870106 (2013) https://doi.org/10.1117/12.2028484
Jongkeun Oh, Junyeol Choi, Jaehyuck Choi, Han-shin Lee, Hyungho Koh, Byunggook Kim, Chanuk Jeon
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870107 (2013) https://doi.org/10.1117/12.2032735
Repair II
C. Y. Chen, Ivan Wei, Laurent Tuo, C. S. Yoo, Dongxue Chen, Danping Peng, Masaki Satake, Bo Su, Linyong Pang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870108 (2013) https://doi.org/10.1117/12.2030688
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870109 (2013) https://doi.org/10.1117/12.2027883
Inspection and Metrology I
Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010A (2013) https://doi.org/10.1117/12.2027201
Wen-Jui Tseng, Yung-Ying Fu, Shih-Ping Lu, Ming-Sian Jiang, Jeffrey Lin, Clare Wu, Sivan Lifschitz, Aviram Tam
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010B (2013) https://doi.org/10.1117/12.2028101
MDP and EDA
Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010C (2013) https://doi.org/10.1117/12.2027851
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010D (2013) https://doi.org/10.1117/12.2028657
Patrick Schiavone, Alexandre Chagoya, Luc Martin, Vincent Annezo, Alexis Blanchemain
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010E (2013) https://doi.org/10.1117/12.2032321
D. Salazar, J. Valadez
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010F (2013) https://doi.org/10.1117/12.2027339
Sebastian Munoz, Raghava Kondepudy
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010G (2013) https://doi.org/10.1117/12.2028495
Yasuki Kimura, Takao Kubota, Kenji Kouno, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010H (2013) https://doi.org/10.1117/12.2028333
FPD Photomasks I
Nobuhiko Yabu, Yoshiyuki Nagai, Satoshi Tomura, Tomohiro Yoshikawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010I (2013) https://doi.org/10.1117/12.2028215
Makoto Takano, Mitsuru Hamakawa, Masahiro Toriguchi, Shinya Kuroda, Atsushi Tajima
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010J (2013) https://doi.org/10.1117/12.2029106
MDP
Erwin Deng, Chun Der Lee, Rachel Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010K (2013) https://doi.org/10.1117/12.2028296
Erwin Deng, Rachel Lee, Chun Der Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010L (2013) https://doi.org/10.1117/12.2028297
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010M (2013) https://doi.org/10.1117/12.2028314
C. Acosta, D. Salazar, D. Morales
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010N (2013) https://doi.org/10.1117/12.2028471
D. Salazar, J. Valadez
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010O (2013) https://doi.org/10.1117/12.2027338
Shoko Saito, Masaru Miyazaki, Mitsuo Sakurai, Takahisa Itoh, Kazumasa Doi, Norioko Sakurai, Tomoyuki Okada
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010P (2013) https://doi.org/10.1117/12.2028330
EUVL Masks I
Kazuaki Matsui, Noriaki Takagi, Satoshi Takahashi, Yutaka Kodera, Yo Sakata, Shinji Akima
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010Q (2013) https://doi.org/10.1117/12.2031845
Tsukasa Abe, Yuichi Inazuki, Yukie Kobayashi, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010R (2013) https://doi.org/10.1117/12.2030183
Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Yoshihiko Naito, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010S (2013) https://doi.org/10.1117/12.2030647
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010T (2013) https://doi.org/10.1117/12.2025362
Lithography Related Technologies
Inspection and Metrology II
Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010V (2013) https://doi.org/10.1117/12.2029363
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010W (2013) https://doi.org/10.1117/12.2032553
EUVL Masks II
Pavel Nesladek, Florian Schunke, Stefan Rümmelin, Kornelia Dittmar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010X (2013) https://doi.org/10.1117/12.2027980
Kosuke Takai, Koji Murano, Eiji Yamanaka, Shinji Yamaguchi, Masato Naka, Takashi Kamo, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010Y (2013) https://doi.org/10.1117/12.2031582
Sung-Il Lee, Yun Song Jeong, Cheol Hong Park, Hee Bom Kim, Inkyun Shin, Chan-Uk Jeon
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 87010Z (2013) https://doi.org/10.1117/12.2032772
EUVL Masks III
Isao Yonekura, Hidemitsu Hakii, Shinya Morisaki, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870110 (2013) https://doi.org/10.1117/12.2031846
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870111 (2013) https://doi.org/10.1117/12.2028069
Yoshiyuki Negishi, Yuki Fujita, Kazunori Seki, Toshio Konishi, Jed Rankin, Steven Nash, Emily Gallagher, Alfred Wagner, Peter Thwaite, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870112 (2013) https://doi.org/10.1117/12.2030765
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870113 (2013) https://doi.org/10.1117/12.2027329
EUVL Masks IV
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870114 (2013) https://doi.org/10.1117/12.2029882
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870115 (2013) https://doi.org/10.1117/12.2032774
EUVL Masks V
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870116 (2013) https://doi.org/10.1117/12.2030653
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870117 (2013) https://doi.org/10.1117/12.2031583
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870118 (2013) https://doi.org/10.1117/12.2030712
Tetsuo Harada, Masato Nakasuji, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XX, 870119 (2013) https://doi.org/10.1117/12.2027283
Back to Top