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20 May 2022 Advancement in two-photon grayscale lithography
Andrea Bertoncini, Yann Tanguy, Alok Tungal, Nicole Lindenmann, Timo Sartor, Roman Reiner, Matthias Blaicher, Sebastian Fisher, Mana Taghdiri, Fabian B. Niesler, André Radke, Michael Thiel
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Proceedings Volume PC12135, 3D Printed Optics and Additive Photonic Manufacturing III; PC1213501 (2022) https://doi.org/10.1117/12.2620974
Event: SPIE Photonics Europe, 2022, Strasbourg, France
Abstract
We present recent advancements in two-photon grayscale lithography (2GL®). In contrast to one-photon grayscale lithography, for 2GL®, the exposed volume pixel is strongly confined to the vicinity of the laser focus allowing for a truly 3-dimensional dose control with very high spatial resolution. Discrete and accurate steps, as well as essentially continuous topographies, can be printed with increased throughput, on any substrate, and without the need for additional lithography steps or mask fabrication. We update on throughput and quality levels of the method. As demonstrators, we fabricate and characterize optics masters for replication technologies like nanoimprint lithography.
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Andrea Bertoncini, Yann Tanguy, Alok Tungal, Nicole Lindenmann, Timo Sartor, Roman Reiner, Matthias Blaicher, Sebastian Fisher, Mana Taghdiri, Fabian B. Niesler, André Radke, and Michael Thiel "Advancement in two-photon grayscale lithography", Proc. SPIE PC12135, 3D Printed Optics and Additive Photonic Manufacturing III, PC1213501 (20 May 2022); https://doi.org/10.1117/12.2620974
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KEYWORDS
Grayscale lithography
Lithography
Mask making
Nanoimprint lithography
Nanotechnology
Spatial resolution
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