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5 October 2023 Visible meta-optics reality: Volume production enabled by NIL
Bradley R. Williams, Daniel Bacon-Brown, Matthew C. George, Rumyana Petrova, Adam W. Korb, Jamie C. Stocks
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Proceedings Volume PC12653, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX; PC126530B (2023) https://doi.org/10.1117/12.2677387
Event: SPIE Nanoscience + Engineering, 2023, San Diego, California, United States
Abstract
Meta-optics have been built in lab settings for years but not on a commercially viable scale. Using electron beam lithography works well in the lab, but this is not an option for volume manufacturing. Patterning subwavelength meta-atom for visible has been just beyond the capabilities of the high-volume deep UV lithography. Due to this patterning barrier, entry into visible meta-optic volume manufacturing has not yet been possible. Moxtek has overcome this barrier and established a volume process line for visible meta-optics utilizing nanoimprint lithography (NIL). Process stability data to qualify the process line for visible meta-optics, confirms that volume manufacturing of metalenses is possible and the patterning barrier has been removed.
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Bradley R. Williams, Daniel Bacon-Brown, Matthew C. George, Rumyana Petrova, Adam W. Korb, and Jamie C. Stocks "Visible meta-optics reality: Volume production enabled by NIL", Proc. SPIE PC12653, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX, PC126530B (5 October 2023); https://doi.org/10.1117/12.2677387
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KEYWORDS
Nanoimprint lithography
Manufacturing
Electron beam lithography
Optics manufacturing
Deep ultraviolet
High volume manufacturing
Lithography
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