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4 October 2023 The art of x-ray optics metrology developed and under development at the Advanced Light Source X-Ray Optics Laboratory
Valeriy V. Yashchuk
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Proceedings Volume PC12695, Advances in Metrology for X-Ray and EUV Optics X; PC1269505 (2023) https://doi.org/10.1117/12.2679206
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States
Abstract
Increasingly stringent requirements on optical elements needed for the new generation x-ray light sources drive the state of the art in ex situ optical metrology. We present an overview of the ongoing efforts at the ALS to bring the x-ray optics and ex situ metrology to the state-of-the-art level. The challenges of x-ray optics and ex situ metrology we address are shared, and we anticipate that the results of our work will be helpful for further development of the Art of Metrology for X-Ray Optics. This work was supported by the DOE BES under contract number DE-AC02-05CH11231.
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Valeriy V. Yashchuk "The art of x-ray optics metrology developed and under development at the Advanced Light Source X-Ray Optics Laboratory", Proc. SPIE PC12695, Advances in Metrology for X-Ray and EUV Optics X, PC1269505 (4 October 2023); https://doi.org/10.1117/12.2679206
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KEYWORDS
X-ray optics
Metrology
Light sources
Optical metrology
X-ray sources
X-rays
Optical mounts
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