A Comparison Of Silver Halide Systems As Applied To Today's Advanced Semiconductor Requirements

Paul H. Johnson; David L. Angel

doi:10.1117/12.958636

5 September 1980 A Comparison Of Silver Halide Systems As Applied To Today's Advanced Semiconductor Requirements

Paul H. Johnson, David L. Angel

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958636
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

An extensive evaluation has been run on the current state of emulsion plates as applicable to the semiconductor industry. Analyses include direct comparisons of different available manufacturers of silver halide light sensitive systems and their ability to produce a viable product applicable to photo-masking. The parameters tested include control of critical dimensions and defects. The test procedure includes optimized and specified processes for each product and associated limitations in speed, safelight effect, image structure and quality and latent image decay. The parameters of optimized use are also investigated and discussed. Tests include imaging from conlact exposure with both normal and reversal processing.

Citation Download Citation

Paul H. Johnson and David L. Angel "A Comparison Of Silver Halide Systems As Applied To Today's Advanced Semiconductor Requirements", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958636

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