Optics In The Model 900 Projection Stepper

Ron Hershel

doi:10.1117/12.958622

5 September 1980 Optics In The Model 900 Projection Stepper

Ron Hershel

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958622
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

Unique optical design features were incorporated into the Model 900 Projection Stepper. The f/4 illuminator uses a pulsed 200 w mercury short arc lamp and a glass light pipe to achieve a uniform intensity of .5 w/cm² at the reticle. The 1:1 projection lens is a folded, double-pass design which consists of a concave mirror and a cemented achromat-prism assembly. With a numerical aperture of .30, the lens achieves diffraction-limited performance at both the g and h mercury lines. Reticle to wafer alignment is detected through the lens and corrected automatically at each exposure step.

Citation Download Citation

Ron Hershel "Optics In The Model 900 Projection Stepper", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958622

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