Paper
1 January 1983 Stability Of Thin Te And Te-Alloy Films For Optical Data Storage
Wen-yaung Lee, M. Chen, H. Wieder, V. Marrello
Author Affiliations +
Proceedings Volume 0382, Optical Data Storage; (1983) https://doi.org/10.1117/12.970216
Event: Optical Data Storage, 1983, Incline Village, United States
Abstract
The stability of Te and Te-alloy films for optical data storage was studied both over a large area by using a uniformly illuminated light source and locally by using a scanning laser beam. These films are found to degrade uniformly, with limited localized degradation. The dominant degradation mechanism of thin Te films is the uniform oxidation of Te to an optically non-absorbing TeO2. Localized degradation occurs only at regions where initial defects on the film or when conditions leading to water condensation on the surface of the film are present. Promising Te-based optical recording media with both excellent archival stability and reasonable laser writing characteristics have been developed from this study.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wen-yaung Lee, M. Chen, H. Wieder, and V. Marrello "Stability Of Thin Te And Te-Alloy Films For Optical Data Storage", Proc. SPIE 0382, Optical Data Storage, (1 January 1983); https://doi.org/10.1117/12.970216
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Cited by 2 scholarly publications.
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KEYWORDS
Tellurium

Polymethylmethacrylate

Reflectivity

Humidity

Corrosion

Thin films

Optical recording

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