A Direct Write Laser Pattern Generator For Rapid Semiconductor Device Customization

E. T. Fitzgibbons; M. Kempter; R. Walther

doi:10.1117/12.940391

1 September 1987 A Direct Write Laser Pattern Generator For Rapid Semiconductor Device Customization

E. T. Fitzgibbons, M. Kempter, R. Walther

Proceedings Volume 0774, Lasers in Microlithography; (1987) https://doi.org/10.1117/12.940391
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

A turn-key system for rapidly producing application specific integrated circuit devices (ASICs) has been developed. A design program is translated from the compiler work station directly to the interconnection metallization of a pre-processed but unpersonalized wafer by a direct write laser pattern generator (DWLPG). This instrument efficiently and precisely exposes photoresist and allows interconnection metal not pertinent to the circuit operation to be removed by etching.

Citation Download Citation

E. T. Fitzgibbons, M. Kempter, and R. Walther "A Direct Write Laser Pattern Generator For Rapid Semiconductor Device Customization", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940391

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