Deep UV Lithography: Problems And Potential

David A. Markle

doi:10.1117/12.940395

1 September 1987 Deep UV Lithography: Problems And Potential

David A. Markle

Proceedings Volume 0774, Lasers in Microlithography; (1987) https://doi.org/10.1117/12.940395
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

In recent years deep UV lithography systems have generated a great deal of interest because of their potential for a greater depth-of-focus for a given resolution. Recent experimental results have shown that 0.5 micron imaging is possible with a number of different deep UV designs. However, this does not guarantee that the next generation of optical lithography systems will operate in the deep UV. Adequate resolution is only one of many criteria that will determine the most practical approach to 0.5 micron lithography. The inherent advantages of deep UV systems may be compromised by a wide variety of difficult problems, while the performance of near UV systems may he extended further than is generally expected.

Citation Download Citation

David A. Markle "Deep UV Lithography: Problems And Potential", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940395

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