Photolithographic Masks For Integrated Optic Circuits Fabricated With An Ar+ Laser System

P. Boffi; O. De Pascale; C. Esposito; M. Gaudio; A. M. Losacco; M. Vilnio

doi:10.1117/12.968895

16 January 1988 Photolithographic Masks For Integrated Optic Circuits Fabricated With An Ar+ Laser System

P. Boffi, O. De Pascale, C. Esposito, M. Gaudio, A. M. Losacco, M. Vilnio

Proceedings Volume 0952, Laser Technologies in Industry; (1988) https://doi.org/10.1117/12.968895
Event: Laser Technologies in Industry, 1988, Porto, Portugal

Abstract

A computer-controlled Argon laser system for writing photolithographic masks over an area as large as 50 mm x 50 mm has been developed. Different waveguide patterns have been written and some field assisted ion-exchange channel waveguides have been fabricated directly into integrated circuit mask plates.

Citation Download Citation

P. Boffi, O. De Pascale, C. Esposito, M. Gaudio, A. M. Losacco, and M. Vilnio "Photolithographic Masks For Integrated Optic Circuits Fabricated With An Ar+ Laser System", Proc. SPIE 0952, Laser Technologies in Industry, (16 January 1988); https://doi.org/10.1117/12.968895

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