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22 February 2017 Development of 250W EUV light source for HVM lithography
Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof M. Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou
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Proceedings Volume 10097, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI; 1009702 (2017) https://doi.org/10.1117/12.2261075
Event: SPIE LASE, 2017, San Francisco, California, United States
Abstract
We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL since 2003. Unique original technologies such as; combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulse shooting and mitigation with magnetic field have been developed in Gigaphoton Inc.. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. We demonstrated 117W EUV power (I/F clean in burst), 50 kHz, 22 hours stable operation at Pilot #1 device. Target of this device is 250 W EUV power by 27 kW pulsed CO2 driver laser system.
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Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof M. Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, and Takashi Saitou "Development of 250W EUV light source for HVM lithography", Proc. SPIE 10097, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI, 1009702 (22 February 2017); https://doi.org/10.1117/12.2261075
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KEYWORDS
Extreme ultraviolet
Gas lasers
Tin
Carbon dioxide lasers
Light sources
Carbon monoxide
Amplifiers
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