Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

Jan Doise; Boon Teik Chan; Masafumi Hori; Roel Gronheid

doi:10.1117/12.2259791

27 March 2017 Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

Jan Doise, Boon Teik Chan, Masafumi Hori, Roel Gronheid

Proceedings Volume 10146, Advances in Patterning Materials and Processes XXXIV; 101460R (2017) https://doi.org/10.1117/12.2259791
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Grapho-epitaxy directed self-assembly is a potential low-cost solution for patterning via layers with pitches beyond the reach of a single optical lithographic exposure. In this process, selective control of the interfacial energy at the bottom and sidewall of the template is an important but challenging exercise. In this work, a dual brush process is implemented, in which two brushes with distinct end-groups are consecutively grafted to the pre-pattern to achieve fully independent modification of the bottom and sidewall surface of the template. A comprehensive study of hole pattern quality shows that using a dual brush process leads to a substantial improvement in terms of positional and dimensional variability across the process window. These findings will be useful to others who wish to manipulate polymer-surface interactions in directed self-assembly flows.

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Citation Download Citation

Jan Doise, Boon Teik Chan, Masafumi Hori, and Roel Gronheid "Dual brush process for selective surface modification in graphoepitaxy directed self-assembly", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460R (27 March 2017); https://doi.org/10.1117/12.2259791

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