Design for nanoimprint lithography: hot spot modification through total NIL process simulation

Sachiko Kobayashi; Kyoji Yamashita; Hirotaka Tsuda; Kazuhiro Washida; Motofumi Komori; Ji-Young Im; Takuya Kono; Tetsuro Nakasugi

doi:10.1117/12.2297361

19 March 2018 Design for nanoimprint lithography: hot spot modification through total NIL process simulation

Sachiko Kobayashi, Kyoji Yamashita, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Ji-Young Im, Takuya Kono, Tetsuro Nakasugi

Author Affiliations +

Proceedings Volume 10584, Novel Patterning Technologies 2018; 105840R (2018) https://doi.org/10.1117/12.2297361
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Technologies for pattern fabrication using imprint process are being developed for various devices. Nanoimpirnt lithography (NIL) is an attractive and promising candidate for its pattern fidelity toward finer device fabrication without using double patterning. Layout and process dependent hotspots become a significant issue for application in smaller pattern size device and, design for manufacturing (DFM) flow comprising imprint process has to be prepared. Focusing on resist drop arrangement method as a process margin expansion knob, simulated non-fill defect is compared with experimental result. Finally, drop arrangement-related hot-spot extraction/modification flow utilizing total NIL simulation is proposed.

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Sachiko Kobayashi, Kyoji Yamashita, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Ji-Young Im, Takuya Kono, and Tetsuro Nakasugi "Design for nanoimprint lithography: hot spot modification through total NIL process simulation", Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840R (19 March 2018); https://doi.org/10.1117/12.2297361

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